Custom-Built Spherical High-Vacuum Chamber

Custom-Built Spherical High-Vacuum Chamber

A multifunctional vacuum chamber with multiple CF confocal ports, capable of reaching pressures as low as 10⁻⁷ mbar. It can be used to fabricate thin films of metallic nanoparticles ranging from 5 to 10 nm in size, with the possibility of embedding them in different matrices (metallic or insulating).

Currently, the chamber is equipped with:

  • Nanoparticle gun.
  • Two 3” magnetrons with independent automated shutters.
  • Rotary sample holder mounted on a retractable arm.
  • Quartz QCM deposition rate monitor mounted on a retractable arm.
  • Electronic gas flow control.

 

Boc-Edwards Auto Coating System 500 Sputtering Equipment

Boc-Edwards
Ideal Equipment for the Fabrication of Thin Films and Multilayers of up to Three Different Materials (Preferably Metallic). Currently, the chamber is equipped with:
  • A vacuum chamber with integrated water cooling.
  • Three 3” magnetrons with an automated shutter system.
  • A two-channel electronic gas flow controller.
  • A substrate holder platform, heatable up to 500ºC, with automated rotational movement.
  • Two radiofrequency power sources (300W and 600W).

Spherical High-Vacuum Chamber for Ceramic Oxide Deposition

Spherical High-Vacuum Chamber for Ceramic Oxide Deposition

Currently used for the fabrication of highly ordered thin films of ceramic oxides with a perovskite structure. The chamber is currently equipped with:

  • Multifunctional vacuum chamber with various CF confocal ports.
  • Pressures up to 10⁻⁷ mbar.
  • One 2’’ magnetron with an automated shutter.
  • Sample holder heatable up to 1000°C.
  • Electronic gas flow controllers.
  • Magnetic characterization equipment.

SQUID Magnetometer Quantum Design MPMS XL with EverCool

SQUID Magnetometer

A highly sensitive measurement system for magnetic properties (magnetization, AC susceptibility). By supplying helium gas bottles, it automatically maintains the internal liquid helium system permanently. Currently, the chamber is equipped with:

  • Measurements up to 5T.
  • Temperature range: 2 to 400K.
  • EverCool helium liquefaction system.
  • DC and AC measurements.

VSM Magnetometer, LDJ9600 Brand

VSM Magnetometer

Routine equipment for quickly performing magnetic measurements, especially at room temperature. Currently, the chamber is equipped with:

  • Fields up to 1.5 T
  • Temperature range from 4.2 to 475 K using an open-flow liquid helium cryostat.

Oxford MagLab EXA Equipment

Mixed measurement equipment that includes magnetic properties and electrical transport from liquid He to 400 K and at high magnetic fields. It operates with a constant supply of liquid He. Currently, the chamber is equipped with:

  • Measurements up to 9 T.
  • Temperature range: 2 to 400 K.
  • Sample holder for electrical resistivity measurements (2 samples).
  • Cantilever sample holder for magnetic torque measurements.
  • Equipment for transverse Kerr effect measurements (MOKE).

This equipment is useful for the surface characterization of very thin magnetic films.

Structural Characterization Equipment

Bruker D8 Advance X-ray Diffractometer

Bruker D8

A versatile instrument for measuring powder diffraction and reflection of thin and multilayer films. Currently, the chamber is equipped with:

  • Theta-Theta configuration
  • X-ray tube: Cu Kα radiation
  • Göbel mirror to produce a parallel beam
  • Special sample holder for reflectivity measurements
  • 0D scintillation point detector
  • 1D LynxEye detector
  • Analysis software: EVA, LEPTOS

Complementary Equipment

Closed-Flow Helium Cryostat

Allows for electrical and magneto-optical resistance measurements. Currently, the chamber is equipped with:

  • Temperature measurement range: 8 K – 320 K
  • Measures multiple samples simultaneously

Vacuum Tubular Furnace

Enables heating small materials up to 1200°C in vacuum or in various controlled atmospheres, while allowing for electrical resistance measurement. Currently, the chamber is equipped with:

  • Quartz tube
  • Maximum temperature: 1200°C
  • Vacuum equipment: rotary pump and turbomolecular pump

Muffle Furnace

Allows heating large samples in uncontrolled atmosphere. Currently, the chamber is equipped with:

  • Maximum temperature: 1200°C
  • Ability to create complex temperature change protocols

Olympus BX50 Metallographic Microscope

Currently, the chamber is equipped with:

  • Dual light source for reflection and transmission work
  • Polarized light
  • Video camera and digital reflex camera for image capture